Ulm, Germany

Olga Tsaryova

This inventor holds 1 USPTO granted patent. Top assignee: New Jersey Institute of Technology. Active years: 2013.


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations of Olga Tsaryova in Thin Film Applications

Introduction

Olga Tsaryova is an accomplished inventor based in Ulm, Germany. She has made significant contributions to the field of materials science, particularly in the development of thin film applications. Her innovative work focuses on perfluoroisopropyl-substituted perfluorophthalocyanines, which have promising applications in semiconductor materials.

Latest Patents

Olga Tsaryova holds a patent for "Thin film applications of perfluoroisopropyl-substituted perfluorophthalocyanines." This patent describes the use of perfluoroisopropyl-substituted perfluorophthalocyanines, including zinc (II), copper (II), and oxo-vanadium (IV) complexes of 29H,31H,1,4,8,11,15,18,22,25-octakis-fluoro-2,3,9,10,16,17,23,24-octakis-perfluoro(isopropyl)phthalocyanine (FPc). These compounds can be sublimed under high vacuum conditions to produce advantageous thin films ranging from 20 to 100 nm on glass substrates through physical vapor deposition. The potential applications of these compounds include their use as semiconductor materials, which could revolutionize the industry.

Career Highlights

Olga Tsaryova is affiliated with the New Jersey Institute of Technology, where she continues her research and development in innovative materials. Her work has garnered attention for its potential impact on various technological applications.

Collaborations

Olga has collaborated with notable researchers such as Sergiu M Gorun and Lukasz Lapok, contributing to the advancement of knowledge in her field.

Conclusion

Olga Tsaryova's innovative work in thin film applications showcases her expertise and dedication to advancing materials science. Her contributions have the potential to influence future technologies significantly.

Profile summary based on public USPTO records.
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