Olga Ostrovsky

Title: Olga Ostrovsky: Innovator in X-ray Fluorescence Analysis

Introduction

Olga Ostrovsky is a prominent inventor based in Haifa, Israel. She has made significant contributions to the field of X-ray fluorescence analysis, particularly in the accurate determination of thickness and elemental composition of small features on thin substrates. Her innovative methods have the potential to enhance various applications in material science and engineering.

Latest Patents

Olga holds a patent for a method titled "Method for accurately determining the thickness and/or elemental composition of small features on thin-substrates using micro-XRF." This method involves directing an X-ray beam onto a sample and measuring an XRF signal excited from the sample. The process includes a reference measurement with one or more first layers formed on a substrate and a target measurement after additional layers are formed. The reference XRF spectrum is used to reduce the contribution of the first layers in the target XRF spectrum, allowing for the estimation of parameters of the second layers.

Career Highlights

Olga is currently employed at Bruker JV Israel Ltd., where she continues to develop and refine her innovative techniques. Her work has positioned her as a key figure in the advancement of X-ray fluorescence technology.

Collaborations

Olga has collaborated with notable colleagues, including Isaac Mazor and Fouad Atrash, contributing to a dynamic research environment that fosters innovation and discovery.

Conclusion

Olga Ostrovsky's contributions to X-ray fluorescence analysis exemplify the impact of innovative thinking in scientific research. Her patented methods are paving the way for advancements in material characterization and analysis.