Ottignies-Louvain-la-Neuve, Belgium

Olga Kameneva

This inventor holds 1 USPTO granted patent. Top assignee: Hexion Inc.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Olga Kameneva. Retrieved from https://idiyas.com/inventor/olga-kameneva

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Olga Kameneva: Innovator in Pressure-Sensitive Adhesives

Introduction

Olga Kameneva is a notable inventor based in Ottignies-Louvain-la-Neuve, Belgium. She has made significant contributions to the field of adhesive technology, particularly through her innovative work on pressure-sensitive adhesive compositions.

Latest Patents

Olga holds a patent for her invention titled "Pressure Sensitive Adhesive Copolymer Compositions." This invention relates to a copolymer composition comprising vinyl ester of 2-ethyl hexanoic acid (VEHA). The adhesive compositions she developed are based on VEHA reacted with (meth)acrylate monomers. These compositions provide a film with high cohesion and adhesion values, specifically achieving a Peel on Teflon of at least 2 N/inch.

Career Highlights

Olga is currently associated with Hexion Inc., where she continues to advance her research and development in adhesive technologies. Her work has been instrumental in enhancing the performance characteristics of adhesive products in various applications.

Collaborations

Olga collaborates with talented professionals in her field, including Nathalie Havaux and François Simal. Their combined expertise contributes to the innovative projects at Hexion Inc.

Conclusion

Olga Kameneva's contributions to adhesive technology exemplify her commitment to innovation and excellence. Her patent on pressure-sensitive adhesive compositions showcases her ability to create solutions that meet industry needs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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