Kyiv, Ukraine

Oleg Yakovchuk

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Oleg Yakovchuk. Retrieved from https://idiyas.com/inventor/oleg-yakovchuk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Oleg Yakovchuk: Innovator in Document Style Adjustment Technology

Introduction

Oleg Yakovchuk is a prominent inventor based in Kyiv, Ukraine. He has made significant contributions to the field of document processing technology. His innovative approach focuses on enhancing user experience through effective document style adjustments.

Latest Patents

Oleg Yakovchuk holds a patent for a method, electronic device, and storage medium for adjusting document style. This patent outlines a process that includes obtaining a target document from a user and a style reference document. The method involves extracting document style information from the style reference document, adjusting the document style of the target document based on this information, and displaying the adjusted document. This invention aims to streamline the document formatting process, making it more intuitive for users.

Career Highlights

Oleg is currently employed at Samsung Electronics Ltd., where he continues to innovate and develop new technologies. His work at Samsung has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Anastasiia Cherneha and Dmytro Zhelezniakov. Their combined expertise contributes to the advancement of technology at Samsung.

Conclusion

Oleg Yakovchuk's contributions to document style adjustment technology exemplify the innovative spirit of modern inventors. His work not only enhances user experience but also sets a precedent for future developments in document processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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