This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1990
Title: Oleg I Kharlamov: Innovator in Gas Cleaning Technology
Introduction
Oleg I Kharlamov is a notable inventor based in Moscow, Russia. He has made significant contributions to the field of gas cleaning technology. His innovative methods aim to improve the efficiency of gas purification processes.
Latest Patents
Oleg I Kharlamov holds a patent for a method of cleaning gas from solid and gaseous matter. This method involves a two-stage scrubbing process using a liquid to clean gas flows. In the first stage, gas is admitted at a velocity of 30-40 m/s and cooled to the temperature of its adiabatic saturation. The second stage involves a gas/liquid mixture admitted at a velocity of 50-70 m/s, cooled to 40-50 degrees Celsius. The process also includes electric precipitation of unwanted matter at a field strength of 5-9 kV/cm, with the gas/liquid flow passing through the electric field at a velocity of 3-4 m/s. The cooling effect at this stage reduces the temperature of the gas/liquid mixture to 20-25 degrees Celsius.
Career Highlights
Throughout his career, Oleg I Kharlamov has focused on developing advanced technologies for environmental protection. His work has been instrumental in enhancing the efficiency of gas cleaning systems. He has demonstrated a commitment to innovation and sustainability in his field.
Collaborations
Oleg I Kharlamov has collaborated with notable professionals such as Norik S Sarkisian and Mark I Tsysin. These collaborations have contributed to the advancement of his research and the successful implementation of his patented technologies.
Conclusion
Oleg I Kharlamov is a distinguished inventor whose work in gas cleaning technology has made a significant impact. His innovative methods and dedication to environmental sustainability continue to influence the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile