Company Filing History:
Years Active: 2019
Title: The Innovative Contributions of Olaf Kievit
Introduction
Olaf Kievit is a notable inventor based in 's-Gravenhage, Netherlands. He has made significant contributions to the field of technology, particularly in the area of wafer and reticle cleaning methods. His innovative approach has led to the development of a unique patent that addresses the challenges of particulate contamination.
Latest Patents
Olaf Kievit holds a patent for a method of removing particulate contaminants from the backside of a wafer or reticle. The invention is directed to a cleaning substrate designed for this specific purpose. The cleaning substrate features protrusions and a tacky layer positioned between these protrusions. The method involves contacting the backside of the wafer or reticle with the protrusions while maintaining a precise distance of 1-10 micrometers from the tacky layer. This innovative technique enhances the cleaning process, ensuring that wafers and reticles are free from contaminants.
Career Highlights
Kievit is associated with the Netherlands Organization for Applied Scientific Research (TNO), where he has been able to apply his expertise in developing advanced cleaning methods. His work at TNO has allowed him to collaborate with other talented professionals in the field, further enhancing the impact of his inventions.
Collaborations
Some of his notable coworkers include Sjoerd Oostrom and Jacques Cor Johan Van Der Donck. Their collaboration has contributed to the advancement of research and development in the field of applied sciences.
Conclusion
Olaf Kievit's innovative work in the field of wafer and reticle cleaning has made a significant impact on technology. His patent demonstrates a practical solution to a common problem in the industry, showcasing his dedication to advancing scientific research and application.