Suwon, South Korea

Ohhee Lee

This inventor holds 2 USPTO granted patents and 10 published patent applications and 3 EPO patents. Top assignees: Samsung Electronics Co., Ltd., Samsung Electronics Ltd.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ohhee Lee. Retrieved from https://idiyas.com/inventor/ohhee-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: Ohhee Lee - Innovator in Electronic Device Technology

Introduction

Ohhee Lee is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of electronic devices, showcasing his innovative spirit and technical expertise. His work is particularly recognized for its practical applications in modern technology.

Latest Patents

Ohhee Lee holds a patent for an electronic device that includes a support member. This device is designed with a first material that forms a support structure, featuring a first surface, a second surface opposite to the first, and an accommodation space between these surfaces. Additionally, the device incorporates an indicator made from a second material, which is visually exposed and aligns with part of the support member's surface. This innovative design enhances the functionality and aesthetic appeal of electronic devices.

Career Highlights

Ohhee Lee is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His role at Samsung allows him to work on cutting-edge projects that push the boundaries of electronic device design and functionality. His contributions have been instrumental in advancing the company's product offerings.

Conclusion

Ohhee Lee's inventive work in electronic devices exemplifies the spirit of innovation that drives the technology industry forward. His patent reflects a blend of creativity and practicality, making a notable impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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