Tel Aviv, Israel

Ofir Baruch Chaim Strull

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Wall to Wall, LLC. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ofir Baruch Chaim Strull. Retrieved from https://idiyas.com/inventor/ofir-baruch-chaim-strull

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Ofir Baruch Chaim Strull: Innovator in Building Design Technology

Introduction

Ofir Baruch Chaim Strull is a notable inventor based in Tel Aviv, Israel. He has made significant contributions to the field of building design through his innovative methods and systems. His work focuses on enhancing the efficiency of architectural design processes.

Latest Patents

Strull holds a patent for a "System, method and computer program product for efficient design of buildings." This patent outlines a method for designing buildings by providing a digital representation of how multiple walls are positioned. The method defines a digital building geometry, allowing for the classification of wall types and junctions, ultimately facilitating the construction of the building once the walls are manufactured. He has 1 patent to his name.

Career Highlights

Strull is currently associated with Wall to Wall, LLC, where he applies his expertise in building design technology. His innovative approach has the potential to revolutionize how buildings are conceptualized and constructed.

Collaborations

Strull collaborates with talented individuals such as Noam Ronen and Tamar Shani Luzon, contributing to a dynamic work environment that fosters creativity and innovation.

Conclusion

Ofir Baruch Chaim Strull is a pioneering inventor whose work in building design technology is shaping the future of architecture. His contributions are significant and reflect a commitment to improving the efficiency of building design processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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