Ness Ziona, Israel

Ofer Ben Bassat

This inventor holds 1 USPTO granted patent. Top assignee: Hp Indigo B.v.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ofer Ben Bassat. Retrieved from https://idiyas.com/inventor/ofer-ben-bassat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Ofer Ben Bassat: Innovator in Conveyor Technology

Introduction

Ofer Ben Bassat is a notable inventor based in Ness Ziona, Israel. He has made significant contributions to the field of conveyor technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and functionality of conveyor systems.

Latest Patents

Ofer Ben Bassat holds a patent for a technology titled "Sensing an article in a conveyor." This invention describes conveyors that comprise a belt for conveying an article, featuring a plurality of holes. The system includes sensors arranged in such a way that an article is detectable when both sensors sense a material simultaneously. This technology has applications in dryers, print substrate pre-treatment apparatus, and printing systems. He has 1 patent to his name.

Career Highlights

Ofer is currently associated with HP Indigo B.V., where he continues to develop innovative solutions in the printing and conveyor technology sectors. His expertise and contributions have positioned him as a valuable asset in his field.

Collaborations

Ofer has worked alongside talented colleagues such as Lior Hershkovitz and Shai Druckman, contributing to various projects and innovations within the company.

Conclusion

Ofer Ben Bassat's work in conveyor technology exemplifies the spirit of innovation and problem-solving. His patent and ongoing contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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