Daejeon, South Korea

Oen-Ho Shin

This inventor holds 1 USPTO granted patent. Top assignee: Korea Water Resources Corporation. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Oen-Ho Shin. Retrieved from https://idiyas.com/inventor/oen-ho-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Oen-Ho Shin: Innovator in Water Resource Management

Introduction

Oen-Ho Shin is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of water resource management through his innovative inventions. His work focuses on improving the efficiency and effectiveness of water sampling techniques.

Latest Patents

Oen-Ho Shin holds a patent for an "Apparatus for sampling filter layer and method using the same." This invention includes a cylindrical tube made of a transparent material, a screw installed at the central portion to shift samples, and a rotary operating unit for rotating the screw. The apparatus is designed with a scale on its outer circumference and a protective cap to prevent damage during excavation. This innovative design enhances the sampling process of filter layers, making it more efficient and user-friendly.

Career Highlights

Oen-Ho Shin is currently employed at Korea Water Resources Corporation, where he applies his expertise in water management technologies. His work has been instrumental in developing solutions that address critical water resource challenges.

Collaborations

He collaborates with talented coworkers such as Jin-Dal Jung and Kyo-Nam Choi, contributing to a dynamic team focused on advancing water resource technologies.

Conclusion

Oen-Ho Shin's contributions to water resource management through his innovative patent demonstrate his commitment to improving environmental sustainability. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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