Location History:
- New York, NY (US) (1977 - 1986)
- Little Silver, NJ (US) (1985 - 2005)
Company Filing History:
9 out of 2,714 
3 out of 4,208 
2 out of 3,345 
Years Active: 1977-2005
Title: Obert R. Wood II: A Pioneer in Lithography Innovations
Introduction
Obert R. Wood II, based in New York, NY, is a prominent inventor known for his significant contributions to the field of lithography. With a remarkable portfolio of 15 patents, Wood has been instrumental in the advancement of technologies that enhance precision and efficiency in semiconductor manufacturing.
Latest Patents
One of Wood's notable inventions is the "Holder, system, and process for improving overlay in lithography." This innovative system addresses long-range errors that can disrupt the alignment between a mask's image and an existing pattern on a wafer. By utilizing either a through-the-lens or an around-the-lens metrology system, the invention accurately determines deformation values to compensate for these errors. The mask or wafer is then adjusted using piezoelectric ceramics to achieve precise alignment.
Another significant contribution is the "Pattern delineating apparatus for use in the EUV spectrum." This patent incorporates the operating principle of the attenuated phase mask within a reflecting structure tailored for extreme ultraviolet radiation. This technology enables a working projection-reduction system that effectively accommodates features of 0.18 micrometers and smaller, merging the mask with all-reflecting optics.
Career Highlights
Throughout his career, Obert R. Wood II has worked with esteemed organizations like Bell Telephone Laboratories and AT&T Corp. His experiences at these leading companies have played a crucial role in shaping his innovative approaches to lithographic technology.
Collaborations
Wood has collaborated with several accomplished professionals, including William T. Silfvast and Donald L. White. These partnerships have facilitated the cross-pollination of ideas, further enhancing his inventive endeavors.
Conclusion
Obert R. Wood II's extensive work and patents in the field of lithography reflect his dedication to innovation and technological advancement. His inventions not only improve existing systems but also pave the way for future developments in semiconductor manufacturing. As the industry continues to evolve, Wood's contributions will undoubtedly remain influential.