Obert R Wood

Title: Obert R. Wood: Innovator in Lithography Mask Structures

Introduction

Obert R. Wood is a notable inventor based in Loudonville, NY (US). He has made significant contributions to the field of lithography through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of mask structures used in manufacturing processes.

Latest Patents

Obert R. Wood holds a patent for "Mask structures and methods of manufacturing." This patent describes a lithography mask structure that includes a substrate, at least one reflective layer over the substrate, and an absorber film stack. The absorber film stack consists of multiple first film layers made from a first material and at least one second film layer made from a different material. The design aims to achieve a total thickness of the absorber film stack of less than 50 nm and ensures that the reflectivity is less than 2% for a predefined wavelength of EUV light. This innovative approach helps in preventing the average crystallite size of the first film layers from exceeding their thickness.

Career Highlights

Obert R. Wood is currently employed at GlobalFoundries Inc., where he continues to push the boundaries of technology in semiconductor manufacturing. His expertise in lithography mask structures has positioned him as a valuable asset in the industry.

Collaborations

Obert has collaborated with talented individuals such as Suraj Kumar Patil and SherJang Singh. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Obert R. Wood's contributions to lithography mask structures exemplify the innovative spirit of modern inventors. His patent and work at GlobalFoundries Inc. highlight the importance of advancements in manufacturing technology.