Toyama, Japan

Obara Haruki

This inventor holds 2 USPTO granted patents. Top assignee: Fanuc Corporation. Active years: 1988-1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Obara Haruki. Retrieved from https://idiyas.com/inventor/obara-haruki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Sagamihara, JP (1988)
  • Toyama, JP (1992)

Company Filing History:


Years Active: 1988-1992

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2 patents (USPTO):Explore Patents

Title: Obara Haruki: Innovator in Electrical Discharge Machining

Introduction

Obara Haruki is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of electrical discharge machining, holding a total of 2 patents. His work focuses on enhancing the efficiency and safety of machining processes.

Latest Patents

Haruki's latest patents include an "Electric discharge machine capable of preventing electrolytic corrosion" and an "Electrical discharge machining power supply." These innovations aim to improve the reliability and performance of electrical discharge machining systems.

Career Highlights

Haruki is currently employed at Fanuc Corporation, a leading company in automation and robotics. His role involves developing advanced machining technologies that contribute to the company's reputation for innovation and quality.

Collaborations

Haruki collaborates with his coworker, Syunzo Izumiya, to further enhance their projects and drive innovation within their field.

Conclusion

Obara Haruki's contributions to electrical discharge machining demonstrate his commitment to advancing technology in this area. His patents reflect a deep understanding of the challenges in machining processes and a dedication to finding effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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