Rochester Hills, MI, United States of America

Nuwandi M Ariyasingha

This inventor holds 1 USPTO granted patent. Top assignee: Wayne State University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nuwandi M Ariyasingha. Retrieved from https://idiyas.com/inventor/nuwandi-m-ariyasingha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Nuwandi M. Ariyasingha: Advancing RASER Technology for Magnetic Resonance

Introduction

Nuwandi M. Ariyasingha is an inventor based in Rochester Hills, Michigan, whose work includes a patent related to radiofrequency amplification by stimulated emission of radiation, or RASER, for magnetic resonance applications. He is associated with Wayne State University.

Latest Patents

Ariyasingha is named on one patent: “Radiofrequency Amplification by Stimulated Emission of Radiation via Parahydrogen-Induced Polarization—A RASER-Inducing Contrast Agent for Magnetic Resonance (MR) Modalities.” The invention describes a contrast agent formed by adding parahydrogen to an unsaturated molecular precursor, enabling RASER of protons and other nuclear spins. This approach is intended for use in magnetic resonance modalities. 1 patent

Career Highlights

Ariyasingha’s listed patent reflects research at the intersection of molecular chemistry and magnetic resonance technology. The invention explores how parahydrogen-induced polarization can support radiofrequency signal amplification, with potential relevance to contrast-agent development.

Collaborations

Ariyasingha’s listed coworker is Baptiste Joalland. Their work is associated with Wayne State University.

Conclusion

Nuwandi M. Ariyasingha’s patent documents an approach to using parahydrogen-induced polarization for RASER-based magnetic resonance contrast, highlighting his contribution to research in this technical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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