Mazkeret-Batya, Israel

Nurit Atar

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Soreq Nuclear Research Center. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nurit Atar. Retrieved from https://idiyas.com/inventor/nurit-atar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Nurit Atar

Introduction

Nurit Atar is a prominent inventor based in Mazkeret Batia, Israel. She has made significant contributions to the field of 3D printing technology. Her innovative work focuses on developing advanced materials for inkjet printing applications.

Latest Patents

Nurit Atar holds a patent for a bismaleimide-based solution for inkjet ink specifically designed for three-dimensional printing. This polyimide-based solution includes an α,ω-Bismaleimide (BMI) terminated oligomer. The oligomer is defined by a specific formula, where R represents aliphatic, aromatic, or mixed aliphatic and aromatic groups. This invention enhances the capabilities of inkjet printing in 3D applications.

Career Highlights

Atar is currently employed at the Soreq Nuclear Research Center, where she applies her expertise in material science and engineering. Her work at this research institution has allowed her to explore innovative solutions in the field of 3D printing.

Collaborations

Nurit collaborates with talented colleagues, including Irina Gouzman and Ronen Verker. These partnerships foster a creative environment that drives innovation and research.

Conclusion

Nurit Atar's contributions to the field of 3D printing through her patented inventions highlight her role as a leading inventor. Her work continues to influence advancements in material science and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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