Nuoya Yang

Title: Nuoya Yang: Innovator in Substrate Processing Technology

Introduction

Nuoya Yang is a notable inventor based in Portland, Oregon, recognized for his contributions to substrate processing technology. He holds a patent that showcases his innovative approach to enhancing multi-patterning processes in semiconductor manufacturing.

Latest Patents

Nuoya Yang's patent, titled "Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processes," presents a sophisticated substrate processing system. This system includes a substrate support equipped with temperature control elements, a memory for storing calibration values, and modules for calibration and operating parameters. The calibration module performs processes to determine temperature and sensitivity calibration values, which are crucial for optimizing trim and deposition amounts based on temperature changes. The solving module then controls the operation of the temperature control elements during critical steps in the substrate processing.

Career Highlights

Nuoya Yang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on developing advanced technologies that improve the efficiency and precision of substrate processing.

Collaborations

Throughout his career, Nuoya has collaborated with esteemed colleagues, including Ramesh Chandrasekharan and Michael Philip Roberts. These collaborations have contributed to the advancement of innovative solutions in the field of semiconductor manufacturing.

Conclusion

Nuoya Yang's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patent reflects a commitment to enhancing manufacturing processes, showcasing his role as a significant inventor in this field.