Palo Alto, CA, United States of America

Norvell J Nelson


Average Co-Inventor Count = 1.3

ph-index = 8

Forward Citations = 193(Granted Patents)


Company Filing History:


Years Active: 1979-1990

Loading Chart...
16 patents (USPTO):Explore Patents

Title: Norvell J Nelson: Innovator in Copper Etching Technology

Introduction

Norvell J Nelson is a prominent inventor based in Palo Alto, California, known for his significant contributions to the field of copper etching technology. With a total of 16 patents to his name, Nelson has developed innovative processes that enhance the efficiency and effectiveness of copper etching.

Latest Patents

Among his latest patents is the "Copper etching process and product with controlled nitrous acid reaction." This invention involves a method where a material promoting the formation of nitrous acid is included in the copper. The copper is etched in a nitric acid solution, with the nitrous acid catalyzing the reaction between the nitric acid and the copper. The catalyst promoter is strategically distributed within the copper to control the formation of nitrous acid, thereby influencing the etching process. Another notable patent is the "Vertical spray etch reactor and method," which describes a system where a nitric acid etching solution is sprayed onto an upright workpiece. This method utilizes low impact, large drops to create a gentle sheeting flow of the etching solution, ensuring an efficient etching process.

Career Highlights

Throughout his career, Nelson has worked with several notable companies, including Psi Star and Varian Associates, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in etching technology.

Collaborations

Nelson has collaborated with esteemed colleagues such as James F Battey and Daniel J Barnett, further enhancing his innovative work in the field.

Conclusion

Norvell J Nelson's contributions to copper etching technology have made a significant impact in the industry. His innovative patents and collaborative efforts continue to influence advancements in this specialized field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…