Ottawa, Canada

Norman Osborne

This inventor holds 1 USPTO granted patent. Top assignee: National Research Council of Canada. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norman Osborne. Retrieved from https://idiyas.com/inventor/norman-osborne

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Norman Osborne

Introduction

Norman Osborne is a notable inventor based in Ottawa, Canada. He has made significant contributions to the field of thin film technology. His work primarily focuses on the development of methods and apparatuses that enhance the efficiency and accuracy of sputtering processes.

Latest Patents

One of Norman Osborne's key patents is titled "Sputtering method and apparatus with optical monitoring." This innovative method involves placing a substrate below a sputtering source assembly within a vacuum chamber. A light beam is projected onto the substrate, passing through an optical passage in the sputtering source assembly. This technique allows for the precise monitoring of the growth of the sputtered film at near normal angles of incidence. He holds 1 patent for this invention.

Career Highlights

Norman Osborne is affiliated with the National Research Council of Canada, where he has been instrumental in advancing research in thin film technologies. His expertise in sputtering methods has positioned him as a valuable asset in his field.

Collaborations

Throughout his career, Norman has collaborated with esteemed colleagues such as Brian T Sullivan and Glenn A Clarke. Their combined efforts have contributed to the advancement of innovative technologies in their respective areas of research.

Conclusion

Norman Osborne's contributions to sputtering technology exemplify the impact of innovation in the field of materials science. His work continues to influence advancements in thin film applications, showcasing the importance of research and development in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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