Chaska, MN, United States of America

Norman L Oberski

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Rudolph Technologies, Inc.. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norman L Oberski. Retrieved from https://idiyas.com/inventor/norman-l-oberski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Norman L. Oberski

Introduction

Norman L. Oberski is a notable inventor based in Chaska, MN (US). He has made significant contributions to the field of semiconductor inspection technology. His work focuses on enhancing the efficiency and accuracy of inspection processes.

Latest Patents

Oberski holds a patent for an "Inspection tool with a 3D point sensor to develop a focus map." This innovative inspection system is designed for inspecting semiconductors or similar substrates. The system includes an inspection device and an auxiliary sensor that collects height data. This data is crucial for generating a map of the semiconductor, which aids in focusing the inspection device effectively. He has 1 patent to his name.

Career Highlights

Norman L. Oberski is currently employed at Rudolph Technologies, Inc., where he continues to develop cutting-edge technologies in semiconductor inspection. His expertise in this area has positioned him as a valuable asset to the company.

Collaborations

Oberski collaborates with various professionals in his field, including his coworker Mark Harless. Their combined efforts contribute to the advancement of inspection technologies.

Conclusion

Norman L. Oberski's innovative work in semiconductor inspection technology exemplifies the impact of dedicated inventors in the industry. His contributions continue to shape the future of inspection processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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