Company Filing History:
Years Active: 2012-2014
Title: Innovations of Norman Hendrikus Rudolf Baars
Introduction
Norman Hendrikus Rudolf Baars is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of charged particle lithography, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of charged particle optical systems.
Latest Patents
Baars' latest patents include a high voltage shielding arrangement of a charged particle lithography system. This invention relates to a high voltage shielding arrangement comprising a first metal part and a second metal part positioned in close vicinity to the first metal part. The second metal part is set at an electrical potential lower than that of the first metal part and is partially encapsulated by an insulator facing the first metal part.
Another significant patent is for a charged particle optical system comprising an electrostatic deflector. This system includes a beamlet generator for generating multiple beamlets of charged particles and an electrostatic deflector for deflecting these beamlets. The deflector consists of first and second electrodes connected to a voltage, generating an electric field for beamlet deflection. The design allows for the arrangement of beamlets in at least one row, directing them through a passing window in the electrostatic deflector.
Career Highlights
Baars is currently associated with Mapper Lithography IP B.V., where he continues to innovate in the field of lithography technology. His work has been instrumental in advancing the capabilities of charged particle systems, which are crucial for modern manufacturing processes.
Collaborations
Some of his notable coworkers include Gerardus Fernandus Ten Berge and Stijn Willem Herman Karel Steenbrink. Their collaborative efforts contribute to the ongoing advancements in the field of charged particle lithography.
Conclusion
Norman Hendrikus Rudolf Baars is a prominent figure in the field of charged particle lithography, with a focus on innovative solutions that enhance system performance. His contributions through patents and collaborations continue to shape the future of this technology.