This inventor holds 1 USPTO granted patent. Top assignee: The Boc Group, Inc.. Active years: 1996.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1996
Title: Innovations of Norman E Allen
Introduction
Norman E Allen is a notable inventor based in Vacaville, California. He has made significant contributions to the field of sputtering technology, particularly with his innovative designs aimed at improving the efficiency and effectiveness of sputtering apparatuses.
Latest Patents
One of his key patents is the "Cylindrical magnetron shield structure." This invention presents an improved shield structure for use in a sputtering apparatus for depositing a film on a substrate. The cylindrically shaped shield structure extends over the ends of a cylindrical sputtering target and features at least one annular structure that interrupts or suppresses the movement of any arc that might otherwise travel across its outside surface. In a preferred embodiment, the annular structure is a groove capable of trapping any such arc and preventing its escape. Additionally, the improved shield structure is electrically isolated to inhibit the formation of severe arcs between it and the cathodic target. This innovative design enhances the overall performance and safety of sputtering processes.
Career Highlights
Norman E Allen is associated with The BOC Group, Inc., where he has contributed his expertise in the development of advanced sputtering technologies. His work has been instrumental in enhancing the capabilities of sputtering apparatuses used in various industrial applications.
Collaborations
Throughout his career, Norman has collaborated with notable colleagues, including Peter A Sieck and James G Rietzel. These collaborations have fostered innovation and the sharing of ideas within the field.
Conclusion
Norman E Allen's contributions to the field of sputtering technology, particularly through his patented cylindrical magnetron shield structure, demonstrate his commitment to innovation and improvement in industrial processes. His work continues to influence the development of advanced sputtering techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
