Norman A Mertke

Title: Innovations by Norman A. Mertke

Introduction

Norman A. Mertke is a notable inventor based in Morgan Hill, CA (US). He has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase his innovative approaches.

Latest Patents

Mertke's latest patents include a method for processing a substrate using a system that features a roller. This method involves rotating wafers in a double-sided scrubber, where a rotating roller imparts rotary motion to a semiconductor wafer during the cleaning process. The roller and wafer make contact at their outer edges, and the friction between them causes the wafer to rotate. The roller is designed with an outer edge that has a groove, which pinches the wafer edge. Additionally, treads or grooves extending from the groove channel liquids away to prevent wafer slippage during rotation and cleaning.

Another patent focuses on a roller with treading and the system that includes it. This invention also revolves around the method and apparatus for rotating wafers in a double-sided scrubber, emphasizing the same principles of friction and design to enhance the cleaning process.

Career Highlights

Norman A. Mertke is currently associated with Ontrak Systems, Inc., where he continues to develop innovative solutions in semiconductor processing. His work has significantly impacted the efficiency and effectiveness of wafer cleaning technologies.

Collaborations

Mertke has collaborated with notable colleagues, including Alan John Jensen and William Dyson, Jr. Their combined expertise has contributed to advancements in their field.

Conclusion

Norman A. Mertke's contributions to semiconductor processing through his patents reflect his innovative spirit and dedication to improving technology. His work continues to influence the industry and pave the way for future advancements.