Hiratsuka, Japan

Noriyuki Sekizawa

This inventor holds 1 USPTO granted patent. Top assignee: Komatsu Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriyuki Sekizawa. Retrieved from https://idiyas.com/inventor/noriyuki-sekizawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: The Innovative Spirit of Noriyuki Sekizawa

Introduction

Noriyuki Sekizawa is a distinguished inventor based in Hiratsuka, Japan. He holds a patent for an innovative plasma arc torch, contributing to advancements in various industries. His work exemplifies the commitment to innovation that drives technological progress.

Latest Patents

Noriyuki Sekizawa has dedicated his efforts to developing a plasma arc torch, a significant invention that enhances precision and efficiency in applications requiring high-temperature energy. This patent represents not only his ingenuity but also his contribution to the field of engineering.

Career Highlights

As part of his career, Sekizawa is associated with Komatsu Corporation, a leading company in the construction and mining equipment industry. His expertise and inventive spirit have been instrumental in fostering new technologies within the organization.

Collaborations

Throughout his career, Noriyuki Sekizawa has collaborated with notable colleagues, including Toshio Yoshimitsu and Hitoshi Sato. These partnerships have bolstered his innovative projects and enriched the work environment at Komatsu Corporation.

Conclusion

Noriyuki Sekizawa's commitment to innovation and technological advancement is evident through his patent achievements and collaborative efforts. He continues to inspire future inventors with his dedication to excellence in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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