This inventor holds 2 USPTO granted patents. Top assignee: Sumitomo Metal Mining Company, Ltd.. Active years: 1993-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993-2005
Title: Noriyuki Saeki: Innovator in Copper-Polyimide Substrates
Introduction
Noriyuki Saeki is a notable inventor based in Niihama, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced substrates for electronic applications. With a total of 2 patents, his work focuses on enhancing the performance and reliability of copper-polyimide substrates.
Latest Patents
Saeki's latest patents include a two-layer copper polyimide substrate and a method of manufacturing a copper-polyimide substrate. The two-layer copper polyimide substrate features a modified layer on the surface of a polyimide film, which is crucial for achieving high adhesion and heat resistance. The method of manufacturing involves hydrophilicating the surface of the polyimide film, applying a catalyst, and subjecting it to electroless plating, ensuring a robust and reliable substrate for various applications.
Career Highlights
Noriyuki Saeki is currently employed at Sumitomo Metal Mining Company, Ltd., where he continues to innovate in the field of materials science. His expertise in copper-polyimide substrates has positioned him as a key figure in the development of advanced electronic materials.
Collaborations
Saeki has collaborated with notable coworkers, including Takefumi Sakou and Akihiro Miyake, contributing to the advancement of their shared projects and innovations.
Conclusion
Noriyuki Saeki's contributions to the field of copper-polyimide substrates demonstrate his commitment to innovation and excellence in materials science. His patents reflect a deep understanding of the complexities involved in substrate manufacturing, paving the way for future advancements in electronic applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
