Yokohama, Japan

Noriyuki Hayama

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriyuki Hayama. Retrieved from https://idiyas.com/inventor/noriyuki-hayama-caavcrie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Noriyuki Hayama: Innovator in Lamp Technology

Introduction

Noriyuki Hayama is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of lighting technology, particularly with his innovative designs and patents.

Latest Patents

Hayama holds a patent for a "Lamp having interference film." This invention features a glass bulb that seals a filament within. A light interference film is formed on the surface of the bulb, consisting of at least five layers. The film is created by alternately stacking a low-refractive index layer made of silicon oxide and a high-refractive index layer. The low-refractive index layer contains additives selected from phosphorus and boron, enhancing the lamp's performance.

Career Highlights

Hayama is associated with Kabushiki Kaisha Toshiba, a leading company in technology and innovation. His work at Toshiba has allowed him to explore and develop advanced lighting solutions that have practical applications in various industries.

Collaborations

Some of his notable coworkers include Yooji Yuge and Umio Maeda. Their collaboration has contributed to the advancement of technology within their field.

Conclusion

Noriyuki Hayama's contributions to lamp technology exemplify the spirit of innovation. His patent for a lamp with an interference film showcases his expertise and commitment to enhancing lighting solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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