Amagasaki, Japan

Noriyuki Hasebe

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriyuki Hasebe. Retrieved from https://idiyas.com/inventor/noriyuki-hasebe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Noriyuki Hasebe: Innovator in Thermal Printing Technology

Introduction

Noriyuki Hasebe is a prominent inventor based in Amagasaki, Japan. He is known for his contributions to the field of thermal printing technology. With a focus on innovation, Hasebe has developed solutions that enhance the efficiency and functionality of printers.

Latest Patents

Hasebe holds a patent for a thermal head designed for printers. This invention includes a substrate, a heater layer, lead wires for supplying electric power, and a protective layer that safeguards the heater layer and lead wires. The protective layer is made from an oxide or a nitride, ensuring durability and reliability in printing applications. He has 1 patent to his name.

Career Highlights

Hasebe is associated with Mitsubishi Electric Corporation, a leading company in the electronics and electrical equipment sector. His work at Mitsubishi has allowed him to contribute significantly to advancements in printing technology.

Collaborations

Hasebe has collaborated with notable colleagues, including Yoshihiro Usui and Eizo Naya. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Noriyuki Hasebe's contributions to thermal printing technology exemplify his commitment to innovation. His patent for a thermal head showcases his expertise and dedication to improving printing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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