Company Filing History:
4 out of 15 
3 out of 21,351 
1 out of 26 
Years Active: 2002-2006
Title: Noriyuki Harashima: Innovator in Semiconductor Technology
Introduction
Noriyuki Harashima is a prominent inventor based in Saitama-ken, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work primarily focuses on methods and apparatuses for dry-etching half-tone phase-shift films and photomasks.
Latest Patents
Harashima's latest patents include a method and apparatus for dry-etching half-tone phase-shift films, as well as half-tone phase-shift photomasks and methods for their preparation. One of his notable innovations involves a dry-etching method that utilizes a mixed gas comprising a reactive ion etching gas and a reducing gas. This method allows for the production of high-precision patterns on photomasks, which are essential for manufacturing semiconductor circuits. The technique effectively reduces dimensional differences caused by the coexistence of coarse and dense patterns, ensuring the creation of high-quality pattern-etched products.
Career Highlights
Throughout his career, Harashima has worked with several notable companies, including Ulvac Coating Corporation and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Harashima has collaborated with esteemed colleagues such as Takaei Sasaki and Satoshi Aoyama. These partnerships have further enhanced his contributions to the field and fostered advancements in semiconductor manufacturing techniques.
Conclusion
Noriyuki Harashima's innovative work in semiconductor technology and his numerous patents highlight his significant impact on the industry. His contributions continue to influence the development of advanced manufacturing processes in the semiconductor field.