Nagoya, Japan

Noriyo Ichinose

This inventor holds 1 USPTO granted patent. Top assignee: Jsol Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriyo Ichinose. Retrieved from https://idiyas.com/inventor/noriyo-ichinose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Noriyo Ichinose: Innovator in Sewing Technology

Introduction

Noriyo Ichinose is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of sewing technology, particularly through his innovative patent that enhances the sewing process. His work is recognized for its practical applications in the textile industry.

Latest Patents

Ichinose holds a patent for a "Sewing analysis system and program." This system includes several key components: a sewing instruction unit that provides guidance on alignment positions of stitching lines, seam allowance widths, and stitching pitch. Additionally, it features a cloth mesh creation unit, a temporary stitching line creation unit, and a beam element creation unit. The system also incorporates a spring element connection unit that connects beam elements of paper pattern outer shape data and a seam allowance folding setting unit that folds seam allowances by applying loads in opposite directions.

Career Highlights

Noriyo Ichinose is associated with Jsol Corporation, where he continues to develop and refine his innovative ideas. His work at the company has allowed him to focus on advancing sewing technology and improving efficiency in the industry.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Noriyo Ichinose's contributions to sewing technology through his innovative patent demonstrate his commitment to enhancing the industry. His work continues to influence the way sewing processes are approached and executed.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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