Kanagawa, Japan

Norio Otake

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norio Otake. Retrieved from https://idiyas.com/inventor/norio-otake

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Norio Otake: Innovator in Gas Purging Technology

Introduction

Norio Otake is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of gas purging technology, particularly with his innovative designs and methods.

Latest Patents

Otake holds a patent for a "Cylinder cabinet and method of purging remaining gas in the pipe thereof." This invention involves a cylinder containing gas that is connected to a delivery side through a series of pipes and valves. The method allows for the efficient purging of gas remaining in the primary pipe by utilizing inert gas and a vacuum generator. The process involves pressurizing the inside of the primary pipe and evacuating it, resulting in high-efficiency gas purging.

Career Highlights

Throughout his career, Norio Otake has demonstrated a commitment to innovation and efficiency in gas handling technologies. His work has contributed to advancements in safety and effectiveness in various industrial applications.

Collaborations

Otake has collaborated with notable colleagues, including Yutaka Sakamoto and Tsuneo Kano. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise.

Conclusion

Norio Otake's contributions to gas purging technology exemplify the impact of innovative thinking in engineering. His patent reflects a dedication to improving industrial processes and enhancing safety measures.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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