Norio Nakano

Title: Norio Nakano: Innovator in Semiconductor Manufacturing

Introduction

Norio Nakano is a prominent inventor based in Kanagawa, Japan. He is known for his significant contributions to the field of semiconductor manufacturing. With a focus on innovative methods, Nakano has developed techniques that enhance the efficiency and effectiveness of semiconductor elements.

Latest Patents

Norio Nakano holds a patent for a "Method for manufacturing semiconductor element." This patent outlines a comprehensive process that includes several key steps. The method begins with a first masking process, where a resist layer is formed on the substrate's surface. It continues with a channel forming process, which involves implanting impurities into the substrate to create a channel region for the well of the FET region. The gate forming process follows, where gates are formed on the well of the FET region and the variable-capacitance diode region. A second masking process generates a second implantation barrier layer, leading to an epitaxy forming process that implants impurities with the opposite polarity to that of the well of the FET region.

Career Highlights

Norio Nakano has made significant strides in his career, particularly through his work at Nexchip Semiconductor Co., Ltd. His innovative approach to semiconductor manufacturing has positioned him as a key figure in the industry. His patent reflects his commitment to advancing technology and improving manufacturing processes.

Collaborations

Norio Nakano has collaborated with notable colleagues, including Masatoshi Taya and Yasuhiro Kumagai. These partnerships have contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Norio Nakano's contributions to semiconductor manufacturing through his innovative patent demonstrate his expertise and dedication to the field. His work continues to influence advancements in technology and manufacturing processes.