This inventor holds 1 USPTO granted patent. Top assignee: Daikin Industries, Ltd.. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Norio Nagahama: Innovator in Antireflection Technology
Introduction
Norio Nagahama is a prominent inventor based in Osaka, Japan. He is known for his contributions to the field of antireflection technology. His innovative work has led to the development of a unique antiglare-treated article that has significant applications in various industries.
Latest Patents
Norio Nagahama holds 1 patent for his invention titled "Antireflection article." This patent describes an antiglare-treated article that comprises an acrylic resin substrate and a fluorine-containing polymer coating. The coating is formed on the surface of the substrate, with a thickness ranging between 0.03 and 0.5 µm. The fluorine-containing polymer has a refractive index between 1.30 and 1.40 and includes a block that is compatible with the acrylic resin, as well as a block comprising a fluorine-containing elastomer. This treated article can be produced stably at low costs while maintaining or exceeding the abrasion resistance and antiglare effects of conventional antiglare-treated articles.
Career Highlights
Norio Nagahama is associated with Daikin Industries, Ltd., where he has made significant contributions to the development of advanced materials. His work has been instrumental in enhancing the performance and cost-effectiveness of antiglare technologies.
Collaborations
Norio has collaborated with notable colleagues, including Takahisa Aoyama and Tetsuo Shimizu. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Norio Nagahama's innovative work in antireflection technology exemplifies the impact of dedicated inventors in advancing material science. His contributions continue to influence the industry and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
