Otake, Japan

Noriko Tan


 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Noriko Tan: Innovator in Polypropylene Technology

Introduction

Noriko Tan is a prominent inventor based in Otake, Japan. She has made significant contributions to the field of materials science, particularly in the development of polypropylene for film capacitors. Her innovative work has led to advancements that enhance the performance and reliability of film capacitors used in various applications.

Latest Patents

Noriko Tan holds a patent for "Polypropylene for film capacitor, polypropylene sheet for film capacitor, method for producing the same, and uses of the same." This invention focuses on a polypropylene material that exhibits excellent stretchability when formed into a film. It provides a film with high breakdown voltage and a small thermal shrinkage ratio, making it suitable for use in film capacitors. The polypropylene is produced by irradiating a propylene homopolymer with a radiation dose ranging from 0.1 to 500 kGy, ensuring optimal properties for its intended applications.

Career Highlights

Noriko Tan is associated with Prime Polymer Co., Ltd., where she has been instrumental in advancing polymer technology. Her work has not only contributed to the company's success but has also positioned her as a key figure in the field of materials innovation. With a focus on enhancing the performance of polypropylene, she continues to push the boundaries of what is possible in capacitor technology.

Collaborations

Noriko collaborates with Satoshi Tamura, who is also a valuable member of her team. Together, they work on innovative projects that aim to improve the functionality and efficiency of polymer materials.

Conclusion

Noriko Tan's contributions to polypropylene technology have made a significant impact on the field of materials science. Her innovative patent and collaboration with talented colleagues highlight her dedication to advancing technology in film capacitors. Her work continues to inspire future innovations in the industry.

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