Osaka, Japan

Noriko Hoshiyama

This inventor holds 1 USPTO granted patent. Top assignee: Daikin Industries, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriko Hoshiyama. Retrieved from https://idiyas.com/inventor/noriko-hoshiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Noriko Hoshiyama: Innovator in Refrigerant Technology

Introduction

Noriko Hoshiyama is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of refrigerant technology, particularly through her innovative designs and patents. Her work is instrumental in enhancing the efficiency of refrigerant systems.

Latest Patents

Noriko holds 1 patent for her invention titled "Refrigerant flow path module and heat source unit." This patent describes a refrigerant flow path module that includes a first pipe portion connected to a discharge pipe and a second pipe portion connected to a suction pipe. The design allows for an integrated flow path that improves the functionality of refrigerant circuits.

Career Highlights

Noriko Hoshiyama is associated with Daikin Industries, Ltd., a leading company in the HVAC industry. Her role at Daikin has allowed her to work on cutting-edge technologies that contribute to energy efficiency and environmental sustainability.

Collaborations

Noriko has collaborated with notable colleagues such as Atsushi Kinoshita and Fumiaki Koike. These partnerships have fostered innovation and have been crucial in the development of advanced refrigerant technologies.

Conclusion

Noriko Hoshiyama's contributions to refrigerant technology exemplify her dedication to innovation and efficiency. Her work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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