Osaka, Japan

Noriko Hattori

This inventor holds 1 USPTO granted patent. Top assignees: Artisan Lab Co., Ltd., Nipro Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriko Hattori. Retrieved from https://idiyas.com/inventor/noriko-hattori-2skqbbs7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Noriko Hattori: Innovator in Hemostasis Materials

Introduction

Noriko Hattori is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of medical materials, particularly in the development of hemostatic agents. Her innovative approach focuses on creating materials that are both effective and safe for human use.

Latest Patents

Noriko Hattori holds a patent for a "Method for producing local hemostasis material, and local hemostasis material." This invention provides a local hemostasis material that exerts minimal influence on the human body, is cost-effective, and demonstrates excellent hemostatic properties. The material comprises a base with a first major surface and a layer of cationized cellulose, which has a thickness of no less than 6.7 μm.

Career Highlights

Throughout her career, Hattori has worked with notable companies, including Artisan Lab Co., Ltd. and Nipro Corporation. Her work has been instrumental in advancing the technology behind hemostatic materials, contributing to improved medical outcomes.

Collaborations

Noriko Hattori has collaborated with esteemed colleagues such as Kazuhiko Shibata and Hiroshi Yoshida. These partnerships have fostered innovation and development in her field.

Conclusion

Noriko Hattori's contributions to the field of hemostatic materials highlight her role as a leading inventor. Her innovative solutions continue to impact medical practices positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…