Yuki, Japan

Norikazu Shinya



Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Norikazu Shinya

Introduction

Norikazu Shinya, an inventive mind from Yuki, Japan, has made a significant contribution to the field of air filtration technology. His innovative approach has led him to secure a patent for a remarkable air filter design, which showcases his dedication to enhancing the efficiency and functionality of air filtration systems.

Latest Patents

Norikazu Shinya holds a single patent titled "Pleated air filter pack and air filter using same." This invention provides a filter pack that does not increase in mass while maintaining an effective filter medium area. The design features a low pressure drop and high strength, making it a significant improvement in air filter technology. The pleated air filter pack incorporates dot embossed projections on the front and rear surfaces of the filter medium, made of non-woven fabric. The zigzag folding along the pleats maintains the necessary interval between the filter media, enhancing performance.

Career Highlights

Shinya is currently with Nippon Muki Co., Ltd., where he utilizes his expertise to develop innovative filtration solutions. His work is characterized by a commitment to improving air quality through advanced engineering and thoughtful design.

Collaborations

Throughout his career, Norikazu has collaborated with talented individuals like Jun Morita and Hitoshi Niinuma. Their combined efforts contribute to a dynamic work environment that fosters innovation and creativity in their projects.

Conclusion

Norikazu Shinya's contributions to air filtration illustrate the importance of innovation in improving everyday products. His patented design demonstrates a thoughtful approach to engineering that prioritizes efficiency without compromising on performance. As he continues to work with Nippon Muki Co., Ltd., his future endeavors are likely to bring even more advancements in the field.

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