Tokyo, Japan

Norikatsu Ono

This inventor holds 3 USPTO granted patents. Top assignee: Dai Nippon Insatsu Kabushiki Kaisha. Active years: 1996-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norikatsu Ono. Retrieved from https://idiyas.com/inventor/norikatsu-ono-dnhkrp5o

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 1996-2000

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3 patents (USPTO):Explore Patents

Title: Norikatsu Ono: Innovator in Thick Film Technology

Introduction

Norikatsu Ono is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of thick film technology, holding a total of 3 patents. His innovative methods have paved the way for advancements in material science and manufacturing processes.

Latest Patents

Ono's latest patents focus on a method of forming thick film patterns and the materials used in this process. The technique involves creating a female mold with a desirable pattern on a substrate. Ceramic material is then filled into the spaces of the mold. Afterward, the female mold is removed by heating the entire substrate, allowing for the formation of a finely detailed thick film pattern. The inorganic paste material used in this process contains an inorganic liquid vehicle with water glass as the main ingredient, along with a powdery solid. This innovative approach minimizes volume change during drying and calcinating, preventing the material from breaking.

Career Highlights

Norikatsu Ono is associated with Dai Nippon Insatsu Kabushiki Kaisha, where he has been instrumental in developing new technologies. His work has significantly impacted the manufacturing sector, particularly in the production of thick film patterns.

Collaborations

Ono has collaborated with notable colleagues, including Yorihiko Sakai and Norikazu Mineo. Their combined expertise has contributed to the success of various projects and innovations in their field.

Conclusion

Norikatsu Ono's contributions to thick film technology exemplify the spirit of innovation. His patents and collaborative efforts continue to influence advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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