Nagoya, Japan

Noriji Oishi

This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignee: Mitsubishi Rayon Company, Limited. Active years: 1992-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriji Oishi. Retrieved from https://idiyas.com/inventor/noriji-oishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0

Average Co-Inventor Count = 1.4

ph-index = 5

Forward Citations = 180(Granted Patents)


Location History:

  • Aichi, JP (1992 - 1994)
  • Nagoya, JP (1992 - 2001)

Company Filing History:


Years Active: 1992-2001

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5 patents (USPTO):Explore Patents

Title: Noriji Oishi: Innovator in Active Energy Ray-Curable Technologies

Introduction

Noriji Oishi is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of active energy ray-curable compositions and lens sheets. With a total of 5 patents to his name, Oishi has established himself as a key figure in innovation.

Latest Patents

His latest patents include advancements in active energy ray-curable compositions and lens sheets. These innovations are crucial for various applications in the manufacturing and technology sectors.

Career Highlights

Oishi is currently employed at Mitsubishi Rayon Company, Limited, where he continues to develop cutting-edge technologies. His work has garnered attention for its potential to revolutionize materials used in various industries.

Collaborations

Throughout his career, Oishi has collaborated with notable colleagues, including Yukichi Konami and Hiroshi Fukushima. These partnerships have further enhanced his innovative capabilities and contributions to the field.

Conclusion

Noriji Oishi's work in active energy ray-curable technologies exemplifies the spirit of innovation. His contributions continue to impact the industry positively, showcasing the importance of research and development in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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