Norihito Fukugami

Title: Norihito Fukugami: Innovator in Photomask Technology

Introduction

Norihito Fukugami is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, holding a total of nine patents. His work focuses on developing advanced materials and structures that enhance the performance and durability of photomasks used in semiconductor manufacturing.

Latest Patents

Fukugami's latest patents include innovations in reflective photomask blanks and reflective photomasks. These inventions are designed to suppress shadowing effects and improve the lifespan of masks. The reflective photomask blank features a substrate with a reflection part that reflects incident light, along with a low reflection part that absorbs incident light. This low reflection part consists of a multi-layer structure, with the outermost layer having specific refractive and extinction properties for extreme ultraviolet (EUV) light. Additionally, his reflective photomask blank is engineered to provide good irradiation resistance and excellent transfer performance, utilizing a combination of reflective and absorption layers formed on a substrate.

Career Highlights

Fukugami has worked with notable companies in the industry, including Toppan Printing Co., Ltd. and Toppan Photomask Co., Ltd. His experience in these organizations has allowed him to refine his expertise in photomask technology and contribute to the advancement of semiconductor manufacturing processes.

Collaborations

Throughout his career, Fukugami has collaborated with talented individuals such as Genta Watanabe and Toru Komizo. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Norihito Fukugami is a key figure in the field of photomask technology, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to impact the semiconductor industry positively.