The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Nov. 01, 2019
Toppan Printing Co., Ltd., Tokyo, JP;
Toru Komizo, Tokyo, JP;
Norihito Fukugami, Tokyo, JP;
Genta Watanabe, Tokyo, JP;
Eisuke Narita, Tokyo, JP;
TOPPAN PHOTOMASK CO., LTD., Tokyo, JP;
Abstract
There is provided a reflective photomask blank and a reflective photomask having good irradiation resistance and capable of obtaining good transfer performance. A reflective photomask blank () contains a reflective layer () reflecting incident light and an absorption layer () absorbing incident light, which are formed in this order on one surface side of a substrate (). The absorption layer () contains a first material selected from the group consisting of tin, indium, and tellurium and a second material containing one or two or more kinds of materials selected from the group consisting of transition metals, bismuth (Bi), and silicon (Si) at least in the outermost layer. The content of the second material is more than 20 at and less than 50 at % in the same laver.