Tokyo, Japan

Norihiro Ooura

This inventor holds 2 USPTO granted patents. Top assignee: Nec Corporation. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihiro Ooura. Retrieved from https://idiyas.com/inventor/norihiro-ooura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 2004

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Norihiro Ooura: Innovator in Memory Control Technology

Introduction

Norihiro Ooura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of computer technology, particularly in memory control systems. With a total of 2 patents to his name, Ooura continues to push the boundaries of innovation in his industry.

Latest Patents

One of Ooura's latest patents is focused on memory control equipment for computers. This invention aims to enhance the efficiency and performance of computer memory systems, making them more reliable and effective for users.

Career Highlights

Ooura is currently employed at NEC Corporation, a leading technology company known for its advancements in information technology and electronics. His work at NEC has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of Ooura's notable coworkers include Shunji Ishida and Tetsuya Nagata. Their combined expertise contributes to the innovative environment at NEC Corporation.

Conclusion

Norihiro Ooura is a key figure in the development of memory control technology, with a focus on improving computer systems. His contributions and collaborations continue to shape the future of technology in Japan and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…