Ishige, Japan

Norihiro Kaiya

This inventor holds 1 USPTO granted patent. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihiro Kaiya. Retrieved from https://idiyas.com/inventor/norihiro-kaiya-5mbnplr0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Norihiro Kaiya: Innovator in Liquid Crystal Technology

Introduction

Norihiro Kaiya is a prominent inventor based in Ishige-Machi, Japan. He has made significant contributions to the field of liquid crystal technology, particularly through his innovative patent that enhances display mediums.

Latest Patents

Kaiya holds a patent for a polymeric material designed for liquid crystal/polymer composite films. This invention provides a record display medium that offers high display contrast and minimizes the risk of contrast reduction or disappearance in extreme temperature conditions. The polymeric material features a glass transition temperature of 150°C or above and is insoluble in water, making it a valuable asset in display technology.

Career Highlights

Norihiro Kaiya is associated with Dai Nippon Printing Co., Ltd., where he has been instrumental in advancing research and development in liquid crystal applications. His work has positioned him as a key figure in the industry, contributing to the evolution of display technologies.

Collaborations

Kaiya has collaborated with notable colleagues, including Wataru Saito and Atsushi Baba. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Norihiro Kaiya's contributions to liquid crystal technology exemplify the impact of innovative thinking in enhancing display mediums. His patent reflects a commitment to advancing technology that meets the demands of modern applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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