Suzuka, Japan

Norihiko Sakata

This inventor holds 7 USPTO granted patents. Top assignees: Asahi Kasei Kogyo Kabushiki Kaisha, Ashai Kasei Kogyo Kabushiki Kaisha. Active years: 1985-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihiko Sakata. Retrieved from https://idiyas.com/inventor/norihiko-sakata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 4

Forward Citations = 32(Granted Patents)


Location History:

  • Suzuka, JP (1985 - 1989)
  • Yokohama, JP (1998)

Company Filing History:


Years Active: 1985-1998

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7 patents (USPTO):Explore Patents

Title: Norihiko Sakata: Innovator in Photosensitive Resin Technology

Introduction

Norihiko Sakata is a prominent inventor based in Suzuka, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 7 patents. His work has been instrumental in advancing the applications of photosensitive materials in various industries.

Latest Patents

Sakata's latest patents include a liquid photosensitive resin composition for use in forming a relief and a photosensitive resin composition used for corrugated board printing. These innovations showcase his expertise in developing materials that enhance manufacturing processes and product quality.

Career Highlights

Throughout his career, Norihiko Sakata has worked with notable companies, including Asahi Kasei Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in resin technology.

Collaborations

Sakata has collaborated with esteemed colleagues such as Nobuo Miura and Itsuo Hamada. These partnerships have fostered a creative environment that has led to innovative solutions in their respective fields.

Conclusion

Norihiko Sakata's contributions to photosensitive resin technology have established him as a key figure in the industry. His patents and collaborations reflect his commitment to innovation and excellence in his work.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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