Norifusa Ishimura

Title: Norifusa Ishimura: Innovations in Modified Conjugated Diene Polymers

Introduction

Norifusa Ishimura, an inventive mind hailing from Tokyo, Japan, has made significant contributions to the field of polymer chemistry. He holds two notable patents that showcase his expertise in developing modified conjugated diene polymers and processes for their production.

Latest Patents

Ishimura's latest patents include a "Modified Conjugated Diene Polymer and Process for Producing Thereof." This invention features a modified conjugated diene polymer that incorporates a modifying group derived from a low molecular weight compound bearing multiple tertiary amino groups and alkoxysilyl groups. The process detailed in the patent outlines a method for polymerizing conjugated diene compounds in a hydrocarbon solvent, utilizing alkali or alkaline earth metal initiators, followed by a reaction that forms the modified polymer.

His other patent, titled "Conjugated Diene Polymer and Process for Production Thereof," pertains to a similar process. It describes the production of a conjugated diene polymer composition through polymerization techniques in hydrocarbon solvents, with specific initiators to enhance the reaction.

Career Highlights

Throughout his career, Ishimura has worked with prominent companies, including Asahi Kasei Chemicals Corporation and Shin-Etsu Chemical Co., Ltd. His contributions in these organizations have solidified his reputation as an innovator in polymer production and chemical engineering.

Collaborations

Norifusa Ishimura has collaborated with notable colleagues, such as Haruo Yamada and Keiichi Toda. Their collective efforts in advancing polymer technologies have further enriched the industry and allowed for advancements in material science.

Conclusion

Norifusa Ishimura's innovative work in modified conjugated diene polymers positions him as a key figure in the field of polymer chemistry. His patents highlight groundbreaking methodologies that contribute not only to the academic community but also to practical applications in various industries. His continued research and collaboration with fellow scientists will undoubtedly lead to further advancements in this essential area of technology.