Tokyo, Japan

Norifumi Ozaki

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norifumi Ozaki. Retrieved from https://idiyas.com/inventor/norifumi-ozaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Norifumi Ozaki: Innovator in Vacuum Processing Technology

Introduction

Norifumi Ozaki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of vacuum processing technology. His innovative approach has led to the development of a unique method for detecting objects in vacuum processing apparatuses.

Latest Patents

Ozaki holds a patent for an "Objects Detecting Method for Vacuum Processing Apparatus." This invention involves a processing unit that includes a vacuum container with a processing chamber for wafer processing and an exhaust pump to remove gas from the chamber. The method enhances the efficiency of wafer transfer by generating a gas flow that facilitates the detection of objects adhering to the wafer's surface.

Career Highlights

Ozaki is associated with Hitachi High-Tech Corporation, where he applies his expertise in vacuum processing technology. His work has been instrumental in advancing the capabilities of vacuum processing systems, making them more effective and reliable.

Collaborations

Throughout his career, Ozaki has collaborated with notable colleagues, including Takaharu Kinoshita and Hisanori Hayano. These partnerships have fostered innovation and contributed to the success of various projects within the company.

Conclusion

Norifumi Ozaki's contributions to vacuum processing technology exemplify the impact of innovative thinking in engineering. His patent and collaborative efforts continue to influence advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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