Ohta, Japan

Noria Sato

This inventor holds 1 USPTO granted patent. Top assignee: Toshiba Silicone Co., Ltd.. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noria Sato. Retrieved from https://idiyas.com/inventor/noria-sato

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Noria Sato: Innovator in Organosilicon Compounds

Introduction

Noria Sato is a distinguished inventor based in Ohta, Japan. He has made significant contributions to the field of organosilicon chemistry. His innovative work has led to the development of a unique process for creating amino group-containing organosilicon compounds.

Latest Patents

Noria Sato holds 1 patent for his invention titled "Process for making amino group-containing organosilicon compounds." This patent describes a method that involves reacting an allylamine with the hydrosilyl group of a silicon compound. This process is crucial for producing organosilicon compounds that contain amino groups, which have various applications in different industries.

Career Highlights

Sato is currently employed at Toshiba Silicone Co., Ltd., where he continues to advance his research and development efforts. His work at Toshiba has allowed him to explore new avenues in organosilicon chemistry, contributing to the company's innovative product offerings.

Collaborations

Noria Sato has collaborated with Michio Zenbayashi, a fellow researcher. Their partnership has fostered a productive environment for innovation and has led to advancements in their respective fields.

Conclusion

Noria Sato's contributions to organosilicon chemistry exemplify the impact of innovative thinking in the field of science. His patent and ongoing work at Toshiba Silicone Co., Ltd. highlight his commitment to advancing technology and improving industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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