Company Filing History:
Years Active: 1992
Title: The Innovative Contributions of Noor U Haq
Introduction
Noor U Haq is a notable inventor based in Saratoga, CA (US). He has made significant contributions to the field of photoresist technology, particularly with his innovative patent related to resist stripping.
Latest Patents
Noor U Haq holds a patent for a positive photoresist stripper composition. This composition includes a solvent system with solubility parameters ranging from about 8.5 to about 15, comprising between about 65% to about 98% of the total composition. Additionally, an amine is present in an amount ranging from about 2% to about 25%, while a fatty acid with 8 to 20 carbon atoms is included in an amount from about 0.1% to about 10%. The specific amounts of the amine and fatty acid are carefully selected to achieve a pH range of about 6 to about 9.5. This innovative composition allows for the effective stripping of positive photoresist from substrates without affecting the metal deposited on them.
Career Highlights
Noor U Haq is currently employed at Ardrox Inc., where he continues to develop and refine his innovative technologies. His work has been instrumental in advancing the capabilities of photoresist stripping processes, which are critical in various manufacturing applications.
Collaborations
Noor has collaborated with talented coworkers, including Wei-Yuan Lin and Dalton Chen, who contribute to the innovative environment at Ardrox Inc. Their combined expertise fosters a culture of creativity and technological advancement.
Conclusion
Noor U Haq's contributions to the field of photoresist technology exemplify the impact of innovative thinking in the industry. His patent for a positive photoresist stripper composition showcases his commitment to advancing manufacturing processes.