Nohno Toda

Title: Nohno Toda: Innovator in Organopolysiloxane Technology

Introduction

Nohno Toda is a prominent inventor based in Ichihara, Japan. He has made significant contributions to the field of organopolysiloxane compositions, holding a total of 6 patents. His work focuses on developing materials with unique properties suitable for various applications, particularly in the semiconductor industry.

Latest Patents

Nohno Toda's latest patents include a curable organopolysiloxane composition that exhibits excellent cold resistance. This composition is designed for precision application and fine pattern formation using a fine droplet coating apparatus, such as a jet dispenser. The composition is hydrosilylation reaction curable and can be precisely applied, demonstrating a viscosity at a strain speed of 1,000 (1/s) of 2.0 Pa·s or less. Additionally, the viscosity at a strain speed of 0.1 (1/s) is 50.0-fold or more than that at a strain speed of 1,000 (1/s). Another notable patent involves a silicone-based adhesive sheet that allows for easy temporary securing of semiconductor chips onto substrates, with permanent adhesion achieved through post-curing.

Career Highlights

Throughout his career, Nohno Toda has worked with notable companies such as Dow Corning and Toray Industries. His experience in these organizations has allowed him to refine his expertise in materials science and contribute to innovative solutions in the industry.

Collaborations

Nohno Toda has collaborated with talented individuals, including Tomohiro Iimura and Sawako Inagaki. These partnerships have fostered a creative environment that has led to the development of advanced technologies in organopolysiloxane applications.

Conclusion

Nohno Toda's contributions to the field of organopolysiloxane technology highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to developing solutions that meet the demands of modern technology.