Company Filing History:
Years Active: 2000-2008
Title: Innovations by Noelle M Waite
Introduction
Noelle M Waite is a prominent inventor based in Clarence Center, NY (US). She has made significant contributions to the field of electrochemical cells, particularly in the context of medical devices. With a total of seven patents to her name, her work focuses on enhancing the efficiency and longevity of lithium/silver vanadium oxide cells.
Latest Patents
One of her latest patents is titled "Discharge methodologies for lithium/silver vanadium oxide cells to manage voltage delay and permanent RDC growth region." This invention addresses the issue of voltage delay and irreversible Rdc growth in lithium/silver vanadium oxide cells, which are commonly used in implantable defibrillators. The methodology involves novel discharge regimes that minimize these issues while reforming the connected capacitors to maintain their rated breakdown voltages. Another significant patent is the "Method for estimating long term end-of-life characteristics using short-term data for lithium/silver vanadium oxide cells." This invention provides a method for analyzing the tail-end behavior of lithium cells, allowing for better predictions of their long-term performance based on shorter-term data.
Career Highlights
Noelle has worked with notable companies such as Wilson Greatbatch Technologies, Inc. and Wilson Greatbatch Ltd. Her experience in these organizations has contributed to her expertise in the development of advanced electrochemical technologies.
Collaborations
Throughout her career, Noelle has collaborated with esteemed colleagues, including Esther S Takeuchi and Kenneth C Syracuse. These collaborations have further enriched her work and innovations in the field.
Conclusion
Noelle M Waite's contributions to the field of electrochemical cells and medical devices demonstrate her innovative spirit and dedication to advancing technology. Her patents reflect her commitment to improving the efficiency and reliability of critical medical equipment.