Tokyo, Japan

Nodoka Onishi

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nodoka Onishi. Retrieved from https://idiyas.com/inventor/nodoka-onishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Nodoka Onishi: Innovator in Mandate Processing Technology

Introduction

Nodoka Onishi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of mandate processing technology. His innovative work has led to the development of a unique patent that addresses the complexities of mandate issuance.

Latest Patents

Nodoka Onishi holds a patent for a "Mandate processing device, mandate processing method, and mandate processing system." This invention includes a mandator setting unit, a mandate content setting unit, and a mandatary setting unit. These components serve as a first presentation unit that presents mandate information candidates based on user information from both the mandator and the mandatary. Additionally, it features a mandate condition setting unit that offers second input candidates for mandate conditions defined by the mandator. The mandate information registration unit then registers the selected mandate information for performing the mandate. This patent showcases his expertise in creating efficient systems for mandate processing.

Career Highlights

Nodoka Onishi is currently employed at Hitachi, Ltd., where he continues to innovate and develop new technologies. His work at Hitachi has allowed him to collaborate with other talented professionals in the field. His contributions have been recognized within the company and the broader technological community.

Collaborations

Some of Nodoka's coworkers include Manami Ikeda and Kosuke Anzai. Their collaborative efforts have further enhanced the development of mandate processing technologies.

Conclusion

Nodoka Onishi is a key figure in the advancement of mandate processing systems. His innovative patent reflects his dedication to improving technology in this area. His work at Hitachi, along with his collaborations, continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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