Hiromachi, Japan

Nobuyuki Ookawa

This inventor holds 1 USPTO granted patent. Top assignee: Sankyo Company, Limited. Active years: 1990.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Nobuyuki Ookawa: Innovator in Cyclic Ether Derivatives

Introduction

Nobuyuki Ookawa is a prominent inventor based in Hiromachi, Japan. He has made significant contributions to the field of chemistry, particularly in the development of cyclic ether derivatives. His innovative work has led to the creation of a patent that showcases his expertise and creativity.

Latest Patents

Nobuyuki Ookawa holds a patent for "Cyclic ether derivatives and their use." This patent includes compounds of a specific formula, where various elements such as oxygen, sulfur, and long-chain alkyl groups play a crucial role. The patent highlights the versatility of these compounds and their potential applications in various industries. He has 1 patent to his name, reflecting his dedication to advancing chemical research.

Career Highlights

Throughout his career, Nobuyuki Ookawa has been associated with Sankyo Company, Limited, where he has contributed to various research initiatives. His work has not only advanced the company's goals but has also pushed the boundaries of what is possible in the field of cyclic compounds. His innovative spirit and commitment to research have made him a valuable asset to his team.

Collaborations

Nobuyuki Ookawa has collaborated with notable colleagues, including Norio Nakamura and Hiroyuki Koike. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking solutions in their field.

Conclusion

Nobuyuki Ookawa's contributions to the field of cyclic ether derivatives exemplify the impact of innovation in chemistry. His patent and collaborations highlight his role as a leading inventor in Japan. His work continues to inspire future advancements in the industry.

Profile summary based on public USPTO records.
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